Detailed Product Description

The main system is controlled by single-chip system, which can be operated by control panel.

Stage can move along XY orientations together with mask and wafer (when off the vacuum.). It can also vacuum-lock this kind of movements (when on the vacuum.). Wafer can move along XYZ  orientations relative to mask

Exposure area: 110mm×110mm

Resolution: 1.0μm (with positive phootresist thickness of 1.5μm)

Alignment accuracy: ≤ ±0.8μm

Mask size: 2.5inch, 3inch, 4inch, 5inch

The uniformity of the exposure: ≤ ±4% within f100mm

Sample size: f15-f100 mm

Sample thickness: 0.1mm-6mm (can be expanded to 15 mm)